Nano Device Fabrication

ISO 6 cleanroom -  120 m2

Fabrication of complex nano-devices with critical dimensions as small as ~ 8 nm
• electron-beam, maskless optical and thermal scanning probe based lithography tools
• ion beam and reactive ion etching tools
• plasma enhanced CVD, ALD, electron beam and ion beam evaporation,
• CO2 snow clean process, plasma asher,…

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