CVD Growth

Dr. Jinxin Liu

Chemical vapour deposition (CVD) is a widely used powerful technology for material synthesis, which offers a clear advantage by relying on growth processes with finely controlled deposition and reaction kinetics, thereby enabling the production of high-quality solid thin films with excellent conformality. Highly compatible with existing complementary metal-oxide-semiconductor (CMOS) technology, CVD synthesis is being pushed to new heights with the precise manufacturing of natural two-dimensional (2D) materials, e.g., graphene and MoS2, towards next-generation (opto-)electronic applications. We believe it will keep developing after adapting to emerging synthetic materials.

In our group, we mainly focus on the CVD growth of synthetic carbon-rich conjugated nanomaterials (CCNs), including 2D conjugated metal-organic frameworks (c-MOFs), 2D polymers, graphene nanoribbons (GNRs), and their van der Waals heterostructures (vdWhs). Owing to the unique planar conjugation structure, the CCNs have exhibited numerous intriguing (opto-)electronic and spin properties, thereby being developed as an attracting material category for electronics and spintronics. We are aiming to the controlled CVD synthesis of CCNs with regulable structural features of layer numbers, crystallinity and molecular assembly, further extending to property tuning and application construction.

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